Small·· 7 小时前精选AI 评分62
偶氮聚合物光刻胶借光致可逆固液转变用于纳米压印光刻
Designing Stable Photoresists Using Polymers With Photoinduced Reversible Solid‐to‐Liquid Transitions for Nanoimprint Lithography
AI 导读
研究设计出具有光致可逆固液转变的偶氮聚合物光刻胶，用于纳米压印光刻，其热稳定性和光稳定性优于传统光刻胶。该光刻胶在实验室存放超过10年仍可用于纳米压印，且可逆固液转变使压印纳米结构中的缺陷能够被修正。偶氮聚合物的线形链结构使其可用溶剂清洗被污染的模具。
推荐理由
偶氮聚合物光刻胶利用光致可逆固液转变实现缺陷修正与模具清洗，并给出存放超过10年仍可用的稳定性证据。
创新点
与传统不可逆光固化光刻胶不同，该偶氮聚合物光刻胶依靠光致可逆固液转变，在保持高分辨图案的同时获得缺陷修正和模具溶剂清洗能力。
图表、补充材料与最终表述以原文为准。阅读原文
来源：Small · doi.org
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